Tantalum sputtering Target – Disc
Nkọwa
Ebumnuche Tantalum sputtering bụ nke etinyere na ụlọ ọrụ semiconductor na ụlọ ọrụ mkpuchi anya.Anyị na-arụpụta nkọwa dị iche iche nke tantalum sputtering lekwasịrị anya na arịrịọ nke ndị ahịa si semiconductor ụlọ ọrụ na ngwa anya ụlọ ọrụ site agụụ EB ọkụ smelting usoro.Site na ịkpachara anya maka usoro ntụgharị pụrụ iche, site na ọgwụgwọ gbagwojuru anya na ezigbo ọkụ na-ekpo ọkụ na oge, anyị na-ewepụta akụkụ dị iche iche nke ebumnuche tantalum sputtering dị ka ebumnuche diski, ebumnuche akụkụ anọ na ebumnuche rotary.Ọzọkwa, anyị na-ekwe nkwa na ịdị ọcha tantalum dị n'etiti 99.95% ruo 99.99% ma ọ bụ karịa;The ọka size bụ n'okpuru 100um, flatness bụ n'okpuru 0.2mm na elu Roughness bụ n'okpuru Ra.1.6μm.Enwere ike ịhazi nha ahụ site na ihe ndị ahịa chọrọ.Anyị na-ejikwa ngwaahịa anyị dị mma site na isi iyi nke akụrụngwa ruo na ahịrị mmepụta niile wee nyefee ndị ahịa anyị iji jide n'aka na ịzụrụ ngwaahịa anyị nwere otu ịdị mma nke ọ bụla.
Anyị na-agbalị ike anyị niile imepe anyị usoro, welie ngwaahịa mma, welie ngwaahịa itinye n'ọrụ ọnụego, wedata ọnụ ahịa, melite ọrụ anyị na-enye ndị ahịa anyị 'na elu àgwà ngwaahịa ma obere ịzụrụ efu.Ozugbo ị họrọ anyị, ị ga-enweta ngwaahịa anyị kwụsiri ike dị elu, ọnụahịa asọmpi karịa ndị na-ebubata ndị ọzọ yana ọrụ anyị na-arụ ọrụ nke ọma n'oge.
Anyị na-emepụta ebumnuche R05200, R05400 nke dabara ọkọlọtọ ASTM B708 ma anyị nwere ike ime ebumnuche dịka eserese gị nyere.N'inweta uru nke tantalum ingots anyị dị elu, akụrụngwa dị elu, teknụzụ ọhụrụ, ndị otu ọkachamara, anyị haziri ebumnuche ịsa sputtering chọrọ.Ị nwere ike ịgwa anyị ihe niile ị chọrọ na anyị raara onwe anyị nye n'ichepụta na mkpa gị.
Ụdị na nha:
ASTM B708 Standard Tantalum Sputtering Target , 99.95% 3N5 - 99.99% 4N Ọcha , Disc Target
Ngwakọta kemịkalụ:
Nyocha a na-ahụkarị: Ta 99.95% 3N5 - 99.99%(4N)
Ọdịla ọla, ppm max site n'ịdị arọ
| Ihe | Al | Au | Ag | Bi | B | Ca | Cl | Cd | Co | Cr | Cu | Fe |
| Ọdịnaya | 0.2 | 1.0 | 1.0 | 1.0 | 0.1 | 0.1 | 1.0 | 1.0 | 0.05 | 0.25 | 0.75 | 0.4 |
| Ihe | Ga | Ge | Hf | K | Li | Mg | Na | Mo | Mn | Nb | Ni | P |
| Ọdịnaya | 1.0 | 1.0 | 1.0 | 0.05 | 0.1 | 0.1 | 0.1 | 5.0 | 0.1 | 75 | 0.25 | 1.0 |
| Ihe | Pb | S | Si | Sn | Th | Ti | V | W | Zn | Zr | Y | U |
| Ọdịnaya | 1.0 | 0.2 | 0.2 | 0.1 | 0.0 | 1.0 | 0.2 | 70.0 | 1.0 | 0.2 | 1.0 | 0,005 |
adịghị ọcha adịghị ọla, ppm max site n'ịdị arọ
| Ihe | N | H | O | C |
| Ọdịnaya | 100 | 15 | 150 | 100 |
Balance: Tantalum
Nha ọka: Nha a na-ahụkarị<100μm Nha ọka
Nha ọka ndị ọzọ dị mgbe a rịọrọ ya
Ọkpụkpọ ala: ≤0.2mm
Ọdịiche dị n'elu: <Ra 1.6μm
Elu: A na-egbu maramara
Ngwa
Ihe mkpuchi maka semiconductors, optics
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